Morphology transition during low-pressure chemical vapor deposition.
نویسندگان
چکیده
Assuming a reemission model, we have studied, in detail, the effect of sticking coefficient on the morphology evolution in low-pressure chemical vapor deposition processes. We have shown that the surface morphology changes from a self-affine fractal to a columnarlike morphology with increasing sticking coefficient, which agrees qualitatively with experimental observations.
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ورودعنوان ژورنال:
- Physical review letters
دوره 87 13 شماره
صفحات -
تاریخ انتشار 2001